Semiconductor manufacturing(Front-end process)sites

A wide range of gases are used in semiconductor manufacturing processes. Describes the gas detectors mainly used for detection of gases in each process, accompanied by illustrations of the corresponding manufacturing processes.

Semiconductor manufacturing plant Front-end process ①

Semiconductor manufacturing plant Front-end process ②

Polycrystalline Si manufacture

Producing polycrystalline silicon involves dissolving metallic silicon in hydrochloric acid (HCI) and refining trichlorosilane (SiHCI3)to increase the purity.
The SiHCI3 is then allowed to react with ultra-pure hydrogen (H2) in a reaction vessel (bell jar) to precipitate and grow cylindrical polycrystalline silicon.

Hazards

Precautions are required to prevent gas leaks. The raw material gas and byproduct gas contains combustible gas in the form of hydrogen (H2) and toxic gases such as trichlorosilane (SiHCI3) and hydrogen chloride (HCI).

Monocrystalline Si ingot manufacture

Silicon oxide film

Silicon nitride film

Lithography

CVD

PVD

Epitaxial

Impurity diffusion

Ion injection method (implanting)

Etching

CMP, washing, ashing

Gas detectors are used in applications like these...

Fixed gas detectors are recommended for the following applications:


Portable gas detectors are recommended for the following applications: